Discussion Group: Separation Methods for Polymers (DSP)

Bastiaan Staal, Basf Ludwigshafen, Germany
The ultimate struggling with GPC-IR. “Krieg oder Sieg”

Peter Schoenmakers, University of Amsterdam, The Netherlands
Using LCxLC technology to jump ahead

Mubasher Bashir, Dow Benelux BV Terneuzen, The Netherlands
Characterization of Silicon- and Carbon-Based UHMW Polymers and Inorganic Colloids by AF4-MALS

Rajesh Chitta, SABIC Bergen op Zoom, The Netherlands
Selective experimental parameters for TREF of propylene-ethylene random copolymers: limiting undercooling of PP

Alan Brooks, Agilent
New evaporative light scattering detector for high temperature GPC/LC applications.