Bastiaan Staal, Basf Ludwigshafen, Germany
The ultimate struggling with GPC-IR. “Krieg oder Sieg”
Peter Schoenmakers, University of Amsterdam, The Netherlands
Using LCxLC technology to jump ahead
Mubasher Bashir, Dow Benelux BV Terneuzen, The Netherlands
Characterization of Silicon- and Carbon-Based UHMW Polymers and Inorganic Colloids by AF4-MALS
Rajesh Chitta, SABIC Bergen op Zoom, The Netherlands
Selective experimental parameters for TREF of propylene-ethylene random copolymers: limiting undercooling of PP
Alan Brooks, Agilent
New evaporative light scattering detector for high temperature GPC/LC applications.